voiceanna.blogg.se - Ac rf isolator

As mentioned previously, primary coil 170 and secondary coil 180 are disposed within respective dielectric discs 110, 120. 2, ferrite pieces 130, 140 are disposed on an outer surface of upper and lower dielectric discs 110, 120.

H01J2237/00- Discharge tubes exposing object to beam, e.g.

H02J50/12- Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling of the resonant type.

H02J50/10- Circuit arrangements or systems for wireless supply or distribution of electric power using inductive coupling.

H02J50/00- Circuit arrangements or systems for wireless supply or distribution of electric power.

H02J- CIRCUIT ARRANGEMENTS OR SYSTEMS FOR SUPPLYING OR DISTRIBUTING ELECTRIC POWER SYSTEMS FOR STORING ELECTRIC ENERGY.

H02- GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER.

H01L21/6833- Details of electrostatic chucks.

H01L21/6831- Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components Apparatus not specifically provided for elsewhere for supporting or gripping using electrostatic chucks.

H01L21/683- Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components Apparatus not specifically provided for elsewhere for supporting or gripping.H01L21/67103- Apparatus for thermal treatment mainly by conduction.H01L21/67098- Apparatus for thermal treatment.H01L21/67011- Apparatus for manufacture or treatment.

H01L21/67005- Apparatus not specifically provided for elsewhere.H01L21/67- Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components Apparatus not specifically provided for elsewhere.H01L21/00- Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof.H01L- SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10.H01J37/32174- Circuits specially adapted for controlling the RF discharge.H01F27/28- Coils Windings Conductive connections.H01J37/32623- Mechanical discharge control means.H01J37/32431- Constructional details of the reactor.

H01J37/32082- Radio frequency generated discharge.H01J37/32009- Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g.for the purpose of examination or processing thereof H01J37/00- Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g.H01J- ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS.H01F27/00- Details of transformers or inductances, in general.H01F- MAGNETS INDUCTANCES TRANSFORMERS SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES.Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.) Filing date Publication date Priority claimed from US15/828,258 external-priority Application filed by Lam Research Corporation filed Critical Lam Research Corporation Priority to KR1020207018813A priority Critical patent/KR20200084367A/en Priority to CN201880077749.2A priority patent/CN111434022A/en Publication of WO2019108434A1 publication Critical patent/WO2019108434A1/en Links BENJAMIN Original Assignee Lam Research Corporation Priority date (The priority date is an assumption and is not a legal conclusion. Inventor Hema Swaroop MOPIDEVI John Pease Thomas W. Google Patents WO2019108434A1 - Ferrite cage rf isolator for power circuitry WO2019108434A1 - Ferrite cage rf isolator for power circuitry